Summary
Micron Technology, Inc. (MU) has entered into significant agreements with Nanya Technology Corporation (NTC) that will impact their ongoing joint development and licensing arrangements. Key among these is the elimination of royalties payable by NTC to Micron on Stack DRAM Products manufactured using process nodes smaller than 50nm. This change, effective April 9, 2010, restructures the financial obligations between the two companies and may influence future profitability for both. Furthermore, a new Joint Development Program and Cost Sharing Agreement (JDP-CSA) has been established, also effective April 9, 2010, specifically for the development of Stack DRAM Designs and Process Technology for nodes under 50nm. This agreement supersedes previous arrangements and introduces cost-sharing for certain research and development expenses through 2017. These agreements signal a deeper collaboration and a shift in how R&D costs are managed for next-generation DRAM technologies.
Key Highlights
- 1Micron and Nanya Technology Corporation (NTC) entered into a Second Amended and Restated Technology Transfer and License Agreement.
- 2Royalties payable by NTC to Micron on Stack DRAM Products manufactured on JDP Process Nodes of less than 50nm have been eliminated, effective April 9, 2010.
- 3A new Joint Development Program and Cost Sharing Agreement (JDP-CSA) was established between Micron and NTC, effective April 9, 2010.
- 4The JDP-CSA focuses on the joint development of Stack DRAM Designs and Process Technology for process nodes of less than 50nm.
- 5The new JDP-CSA supersedes prior joint development agreements concerning process nodes less than 50nm.
- 6The JDP-CSA includes provisions for sharing certain Micron research and development costs through 2017.